COPRA® RF-ICP Plasma Sources for PVD and PECVD
The COPRA Plasma Technology® is based on inductively coupled 13.56 MHz RF plasma excitation. COPRA’s unique feature is the high degree of plasma excitation efficiency in combination with scalability from R&D to any kind of industrial production application. The unrivaled characteristics of COPRA® Plasma Sources enables you to work with constant basic plasma parameters, thus your process result is not negatively affected by scaling in size and speed as long as the power level is adjusted.
CCR Plasma Source Solutions
