When using ammonia is a semiconductor thin film process, an FFKM class vacuum seal is recommended.
Semiconductor Vacuum Sealing Considerations When Using Ammonia (NH3)
Category: Thin Film and Plasma
Thin Film Technology: a Look Back Over 40 Years
Doug Pelleymounter, a Senior Applications Engineer with Advanced Energy (“AE”) who focused mostly on high power PVD applications, has just announced his well-earned retirement after 22 years of service. This is a (mostly verbatim) re-post of Doug’s story, from which
New Products and Services: Plasma and Thin-Film
Here is what’s new at IES Technical Sales related to Plasma and Thin-Film products and services. Please check back from time to time for updates. Advanced Energy Industries: [Posted 2020-04]: Advanced Energy introduces SmartFlex™, a creative financing program designed to enable
Kalrez® Perfluorelastomers: How to Select the Right Compound
“Kalrez®” was the first high performance perfluoroelastomer designed for plasma, high temperature, and wet process applications, and was introduced in the 1970s. Many users think of Kalrez® in a similar way we have all come to think of “Kleenex®” –
SIMS Secondary Ion Mass Spectrometry – Common Applications
The Suib Group at the University of Connecticut collaborated with Hiden Analytical to determine the effectiveness of Hiden’s Compact SIMS (Secondary Ion Mass Spectroscopy) Analysis System for various research applications, including: Surface Contamination on Silver Electrodes Catalyst Dopant Homogeneity Carbon
Extend Service Life of ISO-KF Seals in High Temperature Applications
You can extend service life of ISO-KF seals in high temperature applications by switching from generic fluoroelastomers (FKM) such as Viton, to perfluoroelastomers (FFKM), and by ensuring the seal is properly sized. ISO-KF (or ISO-QF or ISO-NW) type flange seals
Why Emissivity Compensation is Important When Using an Optical Pyrometer
If you are measuring the temperature of a static surface, whether or not its temperature is changing, all is good. But what happens when you are changing the surface and its emissivity is also changing? Your pyrometer inaccuracy can increase
Sputter Deposition: Use a Blocking Filter When Combining DC and RF
If you are depositing dielctric layers using RF and DC (or AC) power simultaneously, you run the great risk of damaging your DC supply and/or creating interference problems. A well designed and constructed “Blocking Filter” will prevent these issues from
Vacuum Technology: How to Select an Exhaust Effluent Trap
There are two common ways to deal with process exhaust effluent: heating the forelines and components to maintain the effluent in a gaseous state until it enters the scrubber, or trapping the effluent in a place where you can access
Thin Film Technology: Update on Cathodic Arc Deposition
This is an excerpt from an article posted by Advanced Energy on February 11, 2014: “Innovating Cathodic Arc Deposition: High-Performance Bias” In the European Union, road transport is the second biggest source of greenhouse gas emissions, right after power generation.