Our low- and mid-frequency power supplies offer highly efficient, easy-to-integrate power for improved process control in a wide variety of applications.
Downloads:
Precision Optical Temperature Measurement Pyrometers & SCR Power Controllers brochure
AE High Voltage Product Guide
AE High Voltage Products Brochure
Mission-Critical High Voltage Components for Mass Spectrometry Systems
Precision Power Product Guide
Products
PEII Low-Frequency Series AC Power
The low-frequency PEII series provides 40 kHz pulse width modulation (PWM) power supplies featuring enhanced arc control and internal load matching with outputs of up to 60 kW—with no external combining hardware such as transformers.
Crystal AC Power Supply
Precise power control is essential for high-density, uniform, reactively sputtered films. The Crystal® power supply offers process engineers and operators a repeatable method for improving throughput and yield with quick yet stable power, fast arc detection, and low arc energy. With power granularity from 60 to 180 kW, it is certain to match the demands of your low-e coating applications.
| Benefits |
Features |
- Optimized process stability and yield
- Enhanced flexibility
- Increased throughput
- Reduced cost of ownership
- World-class service, support, and training
|
- 60, 100, 120, 150, and 180 kW models
- Lowest stored energy in the industry (1 mJ per kW)
- Fastest arc detection and response in the industry (microsecond scale)
- Wide output impedance range
- Suitable for all processes (ZnO, SnO2, TiO2, AI203, Si3N4, Si, SiO2)
- Single-box solution—no hardware or setting changes required when changing sputtering materials
- Wide tap range (2: 1 voltage range at full power on single tap)
- Multiple taps with high strike (>3000 V)
- Power, current, and voltage regulation modes
- Control and interface flexibility
|
Downloads:
Crystal® AC Power Supplies: 60, 100, 120, 150, and 180 kW
Understanding and Optimizing Static Deposition Processes for TFT Manufacturing
Power Supply Topologies
Performance Considerations of High-Power AC Plasma Deposition Power Supplies
Design Aspects of Large-Area Coating Supplies
Closed-Loop-Controlled, Reactive, Dual-Magnetron Sputtering
A New Generation of Power Supplies for Large Area Dual Magnetron Sputtering
